FREMONT, CA--(Marketwire -08/14/12)- Mattson Technology, Inc. (MTSN), a leading supplier of advanced semiconductor processing equipment, today announced that it has shipped its paradigmE etch system ...
The Effect Of Pattern Loading On BEOL Yield And Reliability During Chemical Mechanical Planarization
Chemical mechanical planarization (CMP) is required during semiconductor processing of many memory and logic devices. CMP is used to create planar surfaces and achieve uniform layer thickness during ...
A new approach combining atomic layer deposition and organic film etch process may solve critical challenges in the various processes in advanced nodes. We demonstrated a high selective and ...
To help overcome patterning challenges for leading-edge chips, Applied Materials offers a portfolio of technologies designed to complement the latest advances in lithography. The company’s newest ...
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