Pattern matching is best known for its use in detecting lithographic hotspots, but it’s also widely used across all physical verification flows, and has expanded into design-for-manufacturing (DFM) ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Testing digital designs usually requires one or more digital signals, some of which can be very difficult to generate. Pattern generators are specifically designed to address this problem. Whatever ...