SANTA CLARA, Calif. — Optical proximity correction (OPC) can take days or weeks for 65 nm ICs, and the problem will only get worse at 45 nm. Hoping to head off a computational nightmare, Mentor ...
As the technology advances, OPC run time turns to be a big concern, and a great deal of our effort is directed toward speeding up the litho operations. In addition, the OPC simulation consistency ...
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