LONDON — U.S. chipmakers are using software from Applied Materials Inc. to check changes made by EDA vendors' optical proximity correction software for 65-nanometer manufacturing process development, ...
SANTA CLARA, Calif.--(BUSINESS WIRE)--Anchor Semiconductor Inc. today introduced an easy-to-adopt Optical Proximity Correction (OPC) acceleration tool that will significantly shorten OPC cycle time ...
Some chip makers have been getting a boost from implementing optical proximity correction across the lithography process window at the 65- and even 90-nanometer nodes, but the practice will become ...
The computing demands of modern applications, especially those making heavy use of AI, are extending pressure beyond design ...
The same types of physics-based issues that have haunted lithography for decades have started to impact mask writing as well. The increasingly small and complex mask shapes specified by optical ...
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