Intel announced that it had installed ASML's Twinscan EXE:5200B, the industry's first High-NA lithography tool with 0.55 numerical aperture projection optics made for commercial chip production. The ...
Multi-patterning enables accurate lithographic resolution at today's most advanced nodes. In this white paper, you will learn about: Why advanced process nodes need multi-patterning What role ...
With the ongoing US-China tensions, Huawei exemplified its ability to make 7nm chips without EUV equipment, and chip guru Burn Lin believes it's not surprising for Huawei to achieve the milestone, but ...
As DRAM technologies scale to increasingly tighter pitches, the patterning requirements exceed the limits of conventional single-exposure DUV lithography. In advanced nodes such as D1b (1-beta), ...
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