Some foundries require cut shapes to be aligned with respect to each other or to another layer. As shown in Figure 6, the Calibre Multi-Patterning tool automatically aligns the cut shapes between ...
As any engineer who’s tried it can tell you, creating a design rule check (DRC)-compliant design for self-aligned multi-patterning (SAMP) processes is not a trivial matter. Decomposing the desired ...
Trends in advanced device fabrication require combined lithography-etching multi-patterning sequences and self-aligned multi-patterning to form devices’ finest features at subwavelength dimensions. As ...
With the ongoing US-China tensions, Huawei exemplified its ability to make 7nm chips without EUV equipment, and chip guru Burn Lin believes it's not surprising for Huawei to achieve the milestone, but ...
Multi-patterning enables accurate lithographic resolution at today's most advanced nodes. In this white paper, you will learn about: Why advanced process nodes need multi-patterning What role ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results