SAN JOSE, Calif. – Japan's Toppan Printing Co. Ltd. has developed a photomask manufacturing process at its facility in Asaka, Japan, to support 22- and 20-nm semiconductor device production. This ...
Businesses across Japan plugged into manufacturing semiconductors have been dispatching a steady flow of trainees to a ...
TOKYO, Sept. 09, 2025 (GLOBE NEWSWIRE) -- Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) today announced the release of its next-generation CD-SEM* E3660, engineered ...
When it comes to mask quality, there are two vital measurements: uniformity and linearity. Uniformity measures the consistency of the size of mask features in all occurrences across the entire mask, ...
Prof. Shiyuan Liu's team from Huazhong University of Science and Technology has reported a full-chip EUV curvilinear mask ...
This is the second blog in a three-part series on pixel-level dose correction (PLDC). The first installment was “Improving Uniformity and Linearity for All Masks” from January 29, 2025. PLDC: A new ...
In order to shrink semiconductor mask cycle time and help control costs, Tokyo-based photomask maker Toppan Printing Co Ltd said today that it believes it is the first photomask maker to develop a ...
Fig. 1 The lithography process. The projection lithography system. The advancement of semiconductor manufacturing is a key driver of electronic device innovations. As Moore’s Law progresses, ...
A team of students from Kaunas University of Technology (KTU) and a startup Assero have introduced an innovative see-through mask. The mask prototype won international recognition, as it took second ...
TOKYO, Sept. 09, 2025 (GLOBE NEWSWIRE) -- Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) today announced the release of its next-generation CD-SEM* E3660, engineered ...
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