Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

Glass masks contribute to EUV mask blanks market expansion by offering exceptional surface smoothness, dimensional stability, ...

Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at Imec; Harry Levinson, senior fellow and ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has begun development of a photomask manufacturing for 2-nanometer (10-9 meter) generation logic semiconductors that support ...

MUNICH, Germany — In a joint R&D project, the Advanced Mask Technology Center (AMTC, Dresden), semiconductor equipment provider Vistec (Weilburg and Jena, Germany) and the German metrology institute ...

(Nanowerk News) Recently, researchers from the Shanghai Institute of Optics and Fine Mechanics (SIOM) of the Chinese Academy of Sciences (CAS) have proposed a source mask optimization (SMO) technique ...

Fig. 1 The lithography process. The projection lithography system. The advancement of semiconductor manufacturing is a key driver of electronic device innovations. As Moore’s Law progresses, ...

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...

Yesterday was Intel research day where Intel showed off a wide range of research projects that aim to keep the company healthy in the near to long term. In the Computational Lithography demo area, ...