TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...
Lace, a startup backed by Microsoft, has raised $40 million to build chipmaking equipment based on helium atom beam ...
High‑NA EUV's reduced field size is driving new innovation in optical proximity correction and mask synthesis.
Tesla launched the Hardware 4 Autopilot computer earlier this year, but it's already working on the next-generation chips. The EV maker has been listed among the first companies to benefit from TSMC's ...
OAKLAND, Calif., Feb 28 (Reuters) - Silicon Valley-based Applied Materials Inc (AMAT.O), opens new tab, among the most important makers of tools for chip manufacturing, said on Tuesday it has started ...
Canon has developed a new approach to lithography that reduces costs and energy consumption compared to ASML's EUV systems. Canon's new nanoimprint lithography machine imprints circuit patterns "like ...
Imagine a machine so advanced it operates with light invisible to the human eye, etching circuits onto silicon wafers at scales smaller than a virus. This is the world of EUV lithography, a ...
Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...
TOKYO, Oct. 1, 2025 /PRNewswire/ -- Nikon Corporation is reaffirming the availability of its Digital Lithography System, DSP-100, with orders having commenced in July 2025. This system is specifically ...
Why it matters: Moore's Law might not be dead after all. A new technique using nanomaterials can further miniaturize transistors, allowing fab plants to pack more of them on each chip. This research ...
Substrate, a San Francisco company, is trying to take on powerhouses like the Dutch company ASML. Substrate, a San Francisco company, is trying to take on powerhouses like the Dutch company ASML.