As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Pattern matching is best known for its use in detecting lithographic hotspots, but it’s also widely used across all physical verification flows, and has expanded into design-for-manufacturing (DFM) ...

This file type includes high resolution graphics and schematics. IC physical verification (i.e., design rule checking or “DRC”) used to be easy. In the good old days, you could run some ...

PatMax geometric pattern matching software is now available on the vendor’s In-Sight 5100, 5400 and 3400 vision sensors. PatMax provides accurate feature location despite changes in image angle, size, ...

The software, called PatMax, locates features despite changes in image angle, size, rotation, and appearance. Boasting up to 10 times more accuracy than other pattern-matching technologies, the ...