Plasma discharges have emerged as a pivotal technique in the generation of extreme ultraviolet (EUV) sources, vital for advanced imaging and semiconductor lithography. By initiating and sustaining ...

IntraAction is proud to announce the launch of its latest patent-pending AOD with acousto-optic effect, marking a significant advancement in laser technology. I am proud to witness the unparalleled ...

Chinese electronics giant Huawei is testing elements for an extreme ultraviolet (EUV) lithography machine at its Dongguan facility, according to two sources posting photographs on X social media. The ...