After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...

ITHACA, N.Y. — Cornell University researchers have discovered yet another method for shrinking the design rules on silicon chips. The researchers demonstrated the technique, called controlled etching ...

Plasma etching is a cornerstone technique in semiconductor fabrication, enabling the precise removal of material layers through the use of ionised gases. This process is essential for fabricating ...

With photolithography not able to produce circuit lines much thinner than 100nm, a major focus of research into nanotechnology is in developing means to construct circuits that break the 100nm barrier ...

Extracting hydrogen from water through electrolysis offers a promising route for increasing the production of hydrogen, a clean and environmentally friendly fuel. But one major challenge of water ...

Argonne National Labs have developed a new technique, molecular layer etching, that may help develop microelectronics and show the way beyond Moore’s Law. Molecular layer etching could enable ...

Photochemical etching is a machining technique that leverages the principles behind photography to shape a piece of sheet metal and turn it into a finished product or component. The modern form of ...

Trymax Semiconductor B.V. provides plasma-based etching, stripping, and curing process equipment for advanced semiconductor ...

A team of physicists has uncovered some of the physics that make possible the etching of silicon computer chips, which power cell phones, computers, and a huge range of electronic devices. Physicist ...

Etching is a process that removes unwanted material from a wafer, which is also known as a "slice" or "substrate." Wafers are made of semiconducting material such as crystalline silicon and are used ...