Safety, reliability, and productivity in the nuclear industry result from a systematic consideration of human performance. A plant or other facility consists of both the engineered system and the ...

This file type includes high resolution graphics and schematics when applicable. Here, we give you five simple steps to avoid common errors when evaluating motion-control requirements. This list doesn ...

With the continued need for shrinking pattern dimensions, semiconductor manufacturers continue to implement more complex patterning techniques, such as advanced multi-patterning, for the 10nm design ...

I recently surveyed the on-site development of the control system for a large concentrated solar power station. This “first of a kind” facility offered many control challenges, such as balancing heat ...

Learn to apply control systems in automotive, energy, aerospace, robotics, and manufacturing sectors. Apply feedback control laws to stabilize systems and achieve performance goals. Control systems ...

Have you ever thought about how and why something was designed? Who was considered a “stakeholder” for the design? And what biases are baked within the process of designing something? These are some ...

A system-engineering approach is essential for an efficient design in a complex system. Comprehension of conflicting requirements of participating subsystems and integrated designs are key elements ...

FDA's quality system regulation (QSR) is often perceived by medical product developers as unnecessary overhead. Software developers, in particular, often see it as a nuisance that delays the ...

Author Dr. R. Russell Rhinehart discusses his new book, Nonlinear Model-Based Control: Using First-Principles Models in Process Control, and explains why nonlinear first-principles models should be ...

Software engineers have a host of tooling to organize their projects, chief being Git software like GitLab or GitHub, but hardware engineers today lack that same organizing principle. They are stuck ...

Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...