BENGALURU, India — With design rule checking becoming hugely complex in the deep sub-micron regime, there is a large run time for physical verification tools, for the number of design rules that must ...

WILSONVILLE, Ore.--(BUSINESS WIRE)--Mentor Graphics Corporation (NASDAQ:MENT) today announced the release of a major new product in the HyperLynx® suite, the market-leading, high-speed analysis ...

IC designers are a lucky bunch. Through many years of semiconductor process evolution, the impact of manufacturing limitations and variations on layout could be encapsulated in relatively simple ...

As integrated circuit (IC) designs have grown in complexity, scale and speed requirements, design rule checking (DRC) has evolved from a routine step into a critical pillar of successful tapeouts.

Siemens has locked in electronic design automation (EDA) tool certifications across four of TSMC’s most advanced chip ...

Siemens has announced an extension of its long‑running collaboration with Taiwan Semiconductor Manufacturing Company (TSMC), expanding joint efforts to advance artificial intelligence‑powered ...

The relationship between a place and route (P&R) application and the collection of system-on-chip (SoC) design implementation, analysis, and verification methodologies and tools has always been very ...

For IC design at the 90- and 65-nm process nodes to be truly successful, the design process needs more predictability built into it in terms of yield. The problem, to a large extent, is that there has ...

The design of AMS circuits requires the adoption of specific recipes, the sharing of past experiences, and a huge number of design explorations with different constraints and parameters. The quality ...