SAN JOSE, Calif. — Novellus Systems Inc. moved to lower the cost of chemical mechanical planarization (CMP) Monday (June 21) by rolling out a 300-mm tool that it claimed could be used down to the ...
SAN JOSE, Calif.–Responding to an outcry over the soaring cost of chemical mechanical polishing (CMP) technology, several chip-equipment vendors are readying new tools that are said to bring down the ...
The semiconductor industry is constantly marching toward thinner films and complex geometries with smaller dimensions, as well as newer materials. The number of chemical mechanical planarization (CMP) ...
ACM Research Introduces New Post-CMP Cleaning Tool for Silicon and SiC Wafer Substrate Manufacturing
FREMONT, Calif., July 12, 2022 (GLOBE NEWSWIRE) -- ACM Research, Inc. (ACM) (NASDAQ: ACMR), a leading supplier of wafer processing solutions for semiconductor and advanced wafer-level packaging (WLP) ...
For decades, semiconductor manufacturers have used chemical-mechanical polishing (CMP) as the primary technique for the smoothing and leveling (planarization) of dielectrics and metal layers. CMP ...
At the semicon west semiconductor equipment and materials trade show in San Francisco last month, competing announcements spelled potential trouble for companies in the fast-growing business of ...
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