EXCLUSIVE: Blumhouse-Atomic Monster has appointed Sam Zimmerman as Senior Vice President, Development and Acquisitions, to ...

Atomic layer deposition (ALD) has emerged as a critical technique for fabricating ultrathin films with atomic-scale precision. In particular, ruthenium thin films are of great interest in the ...

Atomic layer deposition (ALD) has emerged as a vital technique for producing high-quality aluminum nitride (AlN) thin films, offering precise control over film thickness and composition. The ability ...

Researchers used experiments and machine learning to accurately model the disordered atomic structure of amorphous aluminum oxide for the first time. A special feature of aluminum oxide is its ability ...

Empa researchers led by Simon Gramatte (front) and Vladyslav Turlo have succeeded for the first time in simulating amorphous aluminum oxide with hydrogen inclusions with atomic precision. Aluminum ...