Hosted on MSN

ASML’s top EUV tool is now key to Intel’s comeback plan

Intel’s comeback in cutting edge manufacturing is no longer a vague roadmap, it now revolves around a single, spectacular machine: ASML’s latest High-Numerical Aperture Extreme Ultraviolet scanner. By ...
SDxCentral

Intel receives its High-NA EUV scanner from ASML

ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...
Optics

ASML and imec open high-NA EUV lithography lab

The semiconductor equipment giant ASML and electronics research center imec have opened a joint laboratory dedicated to high-numerical aperture (high-NA) extreme ultraviolet (EUV) lithography, seen by ...
Digi Times

ASML lifts EUV power to 1,000W, targets 50% chip output gain by 2030

ASML has unveiled an extreme ultraviolet (EUV) upgrade that could raise chip output per scanner by up to 50% by 2030, without expanding cleanroom space or adding new tools. Some subscribers prefer to ...