Intel’s comeback in cutting edge manufacturing is no longer a vague roadmap, it now revolves around a single, spectacular ...

B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.

Intel recently confirmed the latest results in its partnership with ASML. The US chipmaker worked with engineers from the European corporation to install, test, and validate ...

ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...

Intel's foundry arm says it has crossed a major lithography milestone: it has announced successful acceptance testing of ASML ...

Intel Foundry announced that it has managed to install the world's most advanced EUV machine—ASML's TWINSCAN EXE:5200B High-NA EUV scanner—in its facilities. The company is producing its 14A node ...

According to a report from Tom's Hardware, China's so-called "Frankenstein" EUV scanner was assembled from mismatched parts sourced through various channels, potentially including surplus equipment ...

Belgian R&D company Imec has reported a number of chip making breakthroughs at the joint lab it runs with EUV lithography company ASML. According to Imec, it has successfully printed circuit patterns ...

ASML dominates the EUV lithography market, crucial for advanced chip manufacturing. High-NA EUV systems, essential for 1.5nm and sub-1nm chips, promise reduced costs and higher efficiency, with Intel ...

Christophe Fouquet, President, CEO and Chair of the Board of Management, announced the reappointment of Roger Dassen and Frederic Schneider-Maunoury to the Board of Management and the appointment of ...